Ni/NiO网上PbO2薄膜的制备
冯战百，陈 燚，田 楠，龙 飞*
摘 要：本文采用阳极电沉积法在预氧化的Ni网上制备了PbO2薄膜，利用SEM与XRD对PbO2薄膜进行微观表征，探究了不同沉积工艺下PbO2的薄膜形貌变化：（1）在不同电沉积电势下PbO2膜的形貌变化；（2）在不同占空比下PbO2膜的形貌变化；（3）在不同电沉积时间下PbO2膜的形貌及厚度。并得到了最优的沉积参数，沉积电压为2.4V、占空比为0.5。该条件下得到的PbO2膜均匀性与覆盖率最好，为后期在污水处理方面提供了PbO2薄膜制备技术参考。
关键词：电沉积；二氧化铅；电化学氧化法
中图分类号：TB383；TG115.21+5.3 文献标识码：A doi:10.3969/j.issn.1000-6281.2020.03.003
Preparation of PbO2 on Ni/NiO mesh substrate
FENG Zhan-bai1，CHEN Yi1，TIAN Nan1，2*，LONG Fei1，2*
(1. School of Materials Science and Engineering, Key Laboratory of Nonferrous Materials and New Processing Technology of Ministry of Education, Guilin University of Technology, Guilin University of Technology, Guilin Guangxi 541004；2. Guilin University of Technology, Collaborative Innovation Center for Exploration of Hidden Nonferrous Metal Deposits and Resource Efficient Utilization in Guangxi, Guilin Guangxi 541004, China)
Abstract In this paper, PbO2 thin films were prepared on pre-oxidized Ni mesh by anodic electrodeposition. Microscopic characterization of PbO2 thin films was performed using SEM and XRD. The morphology changes of PbO2 thin films under different deposition processes were investigated: (1) morphology changes of PbO2 films under different electrodeposition potentials; (2) morphology changes of PbO2 films under different duty cycles; and (3) morphology and thickness changes of PbO2 films under different electrodeposition times. The best PbO2 film with good homogeneous and coverage was obtained under the deposition potential of 2.4V and the duty cycle of 0.5. The works supply a reference for the PbO2 film preparation in later sewage treatment process.
Keywords electrodeposition；lead dioxide；electrochemical oxidation
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