[1] Youn C J,Jeong T S,Han M S, et al. Influence of various activation temperatures on the optical degradation of Mg doped InGaN /GaN MQW blue LEDs [ J ]. J Cryst Growth, 2003, (250) : 331 - 338.
[2] Nakamura S, Pearton S, et al. The roles of structural imperfections in InGaN-based blue light-emitting diodes and laser diodes[J]. Science, 1998, 281:956.
[3] Dadgar A, Blasing J, Diex A, et al. Metalorganic chemical vapor phase epitaxy of crack-free GaN on Si(111) exceeding 1mm in thickness[J]. Jpn J Appl.Phys, 2000,39:L1183.
[4] Zhao G Y, Nakada.N, et al. GaN on Si substrate with AlGaN/AlN intermediate layer[J]. Jpn J Appl Phys , 1999, 38:L492.
[5] Lu Y, Liu X L, Lu D C, et al. Investigation of GaN layer grown on Si(111) substrate using an ultrathin AlN wetting layer[J]. J Crystal Growth, 2002, 236: 79.
[6] Lee K J, Shin E H, Lin K Y. Reduction of dislocations in GaN epilayers grown on Si(111) substrate using SixNy inserting layer[J]. Appl Phys Lett, 2004, 85(9): 1504.
[ 7] Kotchetkov D, Zou J, Balandin A,et al. Effect of dislocations on thermal conductivity of GaN layer [J]. Appl Phys Lett, 2001, 79 (26) : 4136-4138.
[ 8 ] Qiu X G, Segawa Y, Xue Q K, et al. Photoluminescence of wurtzite GaN thin film on SiC substrate [J]. Appl Phys Lett,2000 , 77 (9):1316-1318.
[9] Mo C L, Fang W Q, Pu Y, et al. Growth and characterization of InGaN blue LED structure on Si(111) by MOCVD[J]. J Cryst Growth, 2005,285:31.
[10] Wu X H, Brown L M, Kapolnek D,et al.Defect structure of metal-organic chemical vapor deposition-grown epitaxial(0001) GaN/Al2O3[J]. J.Appl Phys, 1996, 80:3228.
[11] Liu C H , Chuang R W , Chang S J , et al. InGaN/ GaN MQW blue LEDs with GaN/ SiN double buffer layers[J]. Mater Sci Eng B,2004 , 111 :214.
[12] Nikishin S A, Faleev N N, Antipov V G, et al. High quality GaN grown on Si(111) by gas source molecular beam epitaxy with ammonia[J]. Appl Phys Lett, 1999,75:2073.
[13] Schenk H P D, Kipshidze G D, Lebedev V B, et al. Epitaxial growth of AlN and GaN on Si(111) by plasma-assisted molecular beam epitaxy[J]. J Cryst Grow, 1999, 201/202:359.
[14] Dobos L, Pecz B, Feltin E, et al. Microstructure of GaN layers grown on Si(111) revealed by TEM[J]. Vacuum, 2003,71:285.
[15] Hu G Q , Kong X , Wan L, et al. Microstructure of GaN films grown on Si (111) substrates by metalorganic chemical vapor deposition[J]. J Cryst Growth,2003 , 256 :416.
[16]Wang T, Morishima Y, Naoi N , et al . A new method f or a great reduction of dislocation density in a GaN layer grown on a sapphire substrate[J]. J Cryst Growth, 2000, 213 :188.
[17] Sakai S, Wang T, Morishima Y, et al. A new method of reducing dislocation density in GaN layer grown on sapphire substrate by MOVPE[J]. J Cryst Growth ,2000 ,221 :334.
[18] Speck J S, Rosner S J, et al. The role of threading dislocations in the physical properties of GaN and its alloys[J]. Phys B, 1999, 274:24.