透射电镜图像处理的晶面间距测量系统设计
马晓丽，刘 礼透射电镜图像处理的晶面间距测量系统设计
马晓丽，刘 礼
(1.上海交通大学材料科学与工程学院，上海 200240；2.永大电梯设备(中国)有限公司，上海 201615)
摘 要：为了进一步完善测试分析标准流程、解析和拓展透射电镜软件功能，本文利用上海交通大学材料学院测试分析中心的JEM2100F实验室资质认定透射电镜设备，借助LabVIEW软件的可视化编程模块，建立透射电镜图像处理晶面间距测量系统。对于硅单晶衍射花样，依次进行灰度变换、阈值分割、颗粒搜索与识别、目标测量的图像处理与分析方法，并与标尺像素值进行实际距离换算，得到斑点距离测量值，求倒数后得到晶面间距测量值。对硅单晶高分辨像，首先进行傅里叶变换得到衍射花样，然后利用理想陷波带通频域滤波方法得到各个方向的栅线条纹像，经过图像预处理、阈值分割后，利用卡钳测量多个栅线条纹距离以减小测量误差，与标尺像素值进行实际距离换算后，最后求平均值得到晶面间距测量值。将硅单晶衍射花样晶面间距测量值、高分辨像晶面间距测量值与其标准值进行比对并计算测量误差，以验证实验结果分析精度。
关键词：高分辨像；衍射花样；晶面间距；傅里叶变换；反傅里叶变换
中图分类号：TP391.41；TB383.1 文献标识码：A doi:10.3969/j.issn.1000-6281.2022.02.004
Design of interplanar spacing measurement system based on image processing of TEM
MA Xiao-li1，LIU Li2
(1. School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai 200240；
2. Yungtay Elevator Equipment (China) Co. Ltd., Shanghai 201615，China )
Abstract In order to further improve the test and analysis standard process, analyze and expand the software functions, this paper applied the JEM2100F laboratory qualification of the Test and Analysis Center of Shanghai Jiao Tong University to identify transmission electron microscopy equipment, and established the interplanar spacing measurement system with the help of the visual programming module of LabVIEW software. For the silicon single crystal diffraction pattern, the image processing and analysis methods of gray scale transformation, threshold segmentation, particle search and recognition, target measurement were carried out in sequence, and the pixel value of the scale was converted to obtain the measured value of the spot distance. The crystal plane was obtained after the reciprocal spacing measurement value. For the silicon single crystal high-resolution image, Fourier transform was performed at first to obtain the diffraction pattern, and then the ideal notch bandpass frequency domain filtering method was used to obtain the raster line fringe image in all directions. After image preprocessing and threshold segmentation, the caliper of the stripe distance with multiple grid lines was used to reduce the measurement error. After conversion with the pixel value of the scale, the measured value of the interplanar spacing was finally obtained by averaging method. The measured values for the crystal plane spacing of the silicon single crystal diffraction pattern and the high-resolution image crystal plane spacing were compared with their standard values, respectively. After that, the measurement errors were calculated, and therefore the analysis accuracy of the experimental results can be improved.
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