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NiO外延薄膜的显微结构与光学、电学性能研究

范一丹，闫学习，田 敏，姚婷婷，江亦潇，杨志卿，陈春林*，马秀良,叶恒强
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2024年 第43卷 第4期: 1000-6281（2024）04-440-007     下载地址：

NiO外延薄膜的显微结构与光学、电学性能研究

范一丹，闫学习，田  敏，姚婷婷，江亦潇，杨志卿，陈春林*，马秀良,叶恒强

(1.东北大学 材料科学与工程学院 辽宁 沈阳110016; 2.中国科学院金属研究所 沈阳材料科学国家研究中心，辽宁 沈阳110016; 3.中国科学技术大学 材料科学与工程学院，辽宁 沈阳110016; 4.季华实验室，广东 佛山528200; 5.松山湖材料实验室 大湾区显微科学与技术研究中心，广东 东莞523808；6.中国科学院物理研究所，北京100190)

摘  要   本文利用脉冲激光沉积技术在MgO(100)和Al2O3(0001)衬底上生长了NiO薄膜，并应用高分辨X射线衍射仪、X射线光电子能谱仪和透射电子显微镜表征了两种薄膜的物相、化学成分和显微结构。结果表明，MgO衬底上的NiO薄膜为单晶外延薄膜，薄膜内部存在位错和由衬底扩散来的Mg元素，Al2O3衬底上的NiO薄膜为多晶外延薄膜。采用霍尔效应测试系统和紫外分光光度计测量了NiO薄膜的电阻、可见透射率和能隙。结果表明，单晶NiO薄膜具有较低的电阻，更高的可见光透过率和更大的能隙。本研究表明可以通过选择不同的衬底来调控NiO薄膜的显微结构、光学和电学性质。

关键词   NiO；脉冲激光沉积；透射电子显微学；霍尔效应；物理性能

中图分类号：O43；O47；O76；O77；TG115. 2    文献标识码：A      doi：10.3969/j.issn.1000-6281.2024.05.005

   

The microstructure, optical and electrical properties of NiO epitaxial thin films

FAN Yidan1，2, YAN Xuexi2，3, TIAN Min4, YAO Tingting2，3, JIANG Yixiao2，3, YANG Zhiqing4,

CHEN Chunlin2，3*, MA Xiuliang5，6, YE Hengqiang4

(1. School of Materials Science and Engineering, Northeastern University, Shenyang Liaoning 110016; 2. Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang Liaoning 110016; 3. School of Materials Science and Engineering, University of Science and Technology of China, Shenyang Liaoning 110016; 4. Jihua Laboratory, Foshan Guangdong 528200; 5. Bay Area Center for Electron Microscopy，Songshan Lake Materials Laboratory，Dongguan Guangdong 523808; 6. Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China)

Abstract    NiO thin films were grown on MgO (100) and Al2O3 (0001) substrates using pulsed laser deposition. The phase, chemical composition, and microstructure of the two types of NiO films were characterized by high-resolution X-ray diffraction (HRXRD), X-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM). The results revealed that the NiO film on the MgO substrate was a single-crystal epitaxial film, with dislocations and Mg elements diffusing from the substrate into the film. In contrast, the NiO film on the Al2O3 substrate was a polycrystalline epitaxial film. The sheet resistance, visible transmittance, and band gap of the NiO thin films were measured using a Hall effect test system and a UV spectrophotometer. The findings indicated that the single-crystal NiO thin film exhibited lower sheet resistance, higher visible light transmittance, and a larger band gap. This study demonstrates that the microstructure, as well as the optical and electrical properties of NiO thin films, can be tailored by selecting different substrates.

Keywords    NiO; pulsed laser deposition; transmission electron microscopy; Hall-effect; physical properties

 

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